Engineering the surface termination of oxide substrates

The growth and study of crystal oxide thin films has greatly benefited from techniques to prepare nearly ideal SrTiO3 substrate surfaces, since films grown on these surfaces can be engineered at the atomic level. We have developed advanced etching and annealing techniques to prepare nearly ideal surfaces for other single crystal substrates, expanding the range of oxide heterostructures that can be studied with this atomic level precision.


Saturday, December 14, 2013