Materials Synthesis Facility

Molecular Beam Epitaxy

Synthesis capabilities consist of five molecular beam epitaxy systems in four laboratories. One system is currently dedicated to developing ferroelectric monolayers and growing oxides on semiconductors. The other three systems are research grade MBE systems. These systems consist of a loadlock and MBE chamber with thermal sources, RF plasma oxygen sources, and electron beam sources.  One of them is used as a teaching tool for undergraduates and features custom automation and interlocks to prevent equipment damage. These three systems focus on the deposition of nickelates, titanates, manganites, selenides, and tellurides on up to 50 mm-diameter substrates. A fifth MBE system is attached to Altman’s scanning tunneling microscope for developing monolayer ferroelectrics. This system features reflection high energy electron diffraction (RHEED), a quartz crystal microbalance, and an electron beam evaporation source.

Combinatorial sputtering

Combinatorial sputter deposition system features four sputter sources for deposition on 4 inch-diameter wafers.  Outside access to the deposition tools is through collaborative arrangements with outside users supplying consumables that includes deposition effusion cells, source materials, sputter targets, and crucibles.